Rf vs DC Sputtering: Understanding the Differences Between Two Common Deposition Techniques
Xiangtan Hondson Coating Technology Co., Ltd. is a leading supplier of comprehensive sputtering solutions in China. Our extensive range of sputtering techniques includes both Rf and DC sputtering to cater to diverse demands of the modern industry. Rf sputtering is a process that uses high-frequency electromagnetic fields to ionize and deposit the target material onto the substrate surface. It is ideal for depositing high-quality thin films with precise thickness control and uniformity. Meanwhile, DC sputtering is a powerful technique that involves the application of a direct current power supply to create a plasma and sputter the target material onto the substrate. With our superior sputtering systems, you can enjoy consistent and reliable deposition with minimal wastage of materials. Our products are offered at competitive prices, and we take pride in being a trusted and reputable factory and supplier of sputtering equipment. Experience the best sputtering solutions today with Xiangtan Hondson Coating Technology Co., Ltd.